Dr. Lloyd Harriott is a member of the Electrical Engineering faculty at the University of Virginia, where he now serves as the Department Chair. During his career, Dr. Harriott developed technology and applications for advanced lithography including direct write electron beam lithography (EBES), focused ion beam (FIB), and SCALPEL projection electron beam lithography as well as advance optical lithography including deep ultraviolet (DUV), phase shifting (PSM) and other methods. He is currently doing research in nanofabrication and molecular electronics. He has written over 120 technical and scientific papers, two book chapters, and holds eight US patents. He has served on program committees and chaired several international conferences in the field of lithography. Dr.
Harriott received his undergraduate degree in Physics from Hartwick College. He attended the State University of New York at Binghamton from 1976 to 1980, where he received his master’s and Ph.D. degrees in physics.

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